US 12,224,288 B2
Array base plate, method for manufacturing same, and display panel
Jiahui Huang, Huizhou (CN)
Assigned to Huizhou China Star Optoelectronics Display Co., Ltd., Huizhou (CN); and TCL China Star Optoelectronics Technology Co., Ltd., Shenzhen (CN)
Appl. No. 17/620,678
Filed by Huizhou China Star Optoelectronics Display Co., Ltd., Huizhou (CN); and TCL China Star Optoelectronics Technology Co., Ltd., Shenzhen (CN)
PCT Filed Nov. 12, 2021, PCT No. PCT/CN2021/130398
§ 371(c)(1), (2) Date Dec. 18, 2021,
PCT Pub. No. WO2023/070753, PCT Pub. Date May 4, 2023.
Claims priority of application No. 202111250392 (CN), filed on Oct. 26, 2021.
Prior Publication US 2024/0047465 A1, Feb. 8, 2024
Int. Cl. H01L 27/12 (2006.01)
CPC H01L 27/1222 (2013.01) [H01L 27/1288 (2013.01)] 6 Claims
OG exemplary drawing
 
1. An array base plate, comprising:
a substrate;
an active layer disposed on the substrate;
an etching protective layer and an ohmic contact layer, wherein the etching protective layer and the ohmic contact layer are disposed in a same layer, the etching protective layer is located on a body portion of the active layer, and the ohmic contact layer is located on a first conduction portion and a second conduction portion of the active layer;
a source disposed on the ohmic contact layer located on the first conduction portion of the active layer; and
a drain disposed on the ohmic contact layer located on the second conduction portion of the active layer;
wherein a material of the ohmic contact layer comprises a metal or metal oxide, and a material of the etching protective layer comprises an Si-based insulating material.