| CPC H01L 21/6708 (2013.01) [H01L 21/31133 (2013.01); H01L 21/67259 (2013.01)] | 14 Claims |
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1. A substrate processing apparatus comprising:
a substrate holder that holds a substrate;
a supporter including a rotary motor that supports the substrate holder and rotates the substrate held by the substrate holder in a circumferential direction;
a driver that drives the substrate holder with respect to the supporter in a first direction and a second direction, the first direction extending along a plane of the substrate, the second direction extending along the plane of the substrate and intersecting the first direction;
a detector that detects an outer edge portion of the substrate held by the substrate holder;
a chemical liquid discharger that discharges a chemical liquid to the outer edge portion of the substrate held by the substrate holder;
a controller configured to cause the driver to drive the substrate holder in the first direction and the second direction based on the outer edge portion detected by the detector in a manner that a center position in the plane of the substrate held by the substrate holder matches a rotation axis of the supporter; and
vacuum chucks that fix a position of the substrate in the plane direction with respect to the substrate holder and fix a position of the substrate holder in the plane direction with respect to the supporter,
wherein during a position correction processing of the substrate, the controller is configured to maintain the plane of the substrate along the first direction and the second direction by maintaining that the position of the substrate in the plane direction is fixed with respect to the substrate holder by the locking mechanism, and
the supporter rotates the driver and the vacuum chucks with the substrate holder.
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