| CPC H01J 37/32522 (2013.01) [C23C 16/463 (2013.01); H01J 37/32724 (2013.01); H01J 37/32889 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H01J 2237/002 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/334 (2013.01)] | 21 Claims |

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1. A manifold assembly for a processing chamber in a substrate processing system, the manifold assembly comprising:
a manifold including
a first valve assembly configured to flow a liquid coolant at a first temperature from a first channel of a coolant assembly to the processing chamber, wherein the first valve assembly is configured to flow the liquid coolant at a cryogenic temperature;
a first weldment block including tubing associated with the first valve assembly,
a second valve assembly configured to flow the liquid coolant at a second temperature from a second channel of the coolant assembly to the processing chamber, wherein the second temperature is greater than the first temperature, and
a second weldment block including tubing associated with the second valve assembly; and
an insulative housing enclosing the first valve assembly, the first weldment block, and the second weldment block,
wherein the insulative housing is comprised of a plurality of layers of an insulative material.
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