US 12,224,156 B2
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool
Xiaopu Li, San Jose, CA (US); Jozef Kudela, Morgan Hill, CA (US); Kallol Bera, Fremont, CA (US); Tsutomu Tanaka, Santa Clara, CA (US); and Dmitry A. Dzilno, Sunnyvale, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 29, 2021, as Appl. No. 17/244,824.
Application 17/244,824 is a continuation in part of application No. 16/976,569, granted, now 11,823,871, previously published as PCT/US2019/020264, filed on Mar. 1, 2019.
Claims priority of provisional application 62/637,353, filed on Mar. 1, 2018.
Prior Publication US 2021/0327686 A1, Oct. 21, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32211 (2013.01) [H01J 37/32449 (2013.01); H01J 37/32568 (2013.01); H01J 2237/332 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A plasma source assembly comprising:
a powered electrode having a first end and a second end defining a length and having an elongate axis extending along the length of the powered electrode, the powered electrode having a thickness and width;
a ground electrode on a first side of the powered electrode, the ground electrode spaced from the powered electrode by a distance;
a dielectric on a second side of the powered electrode, the dielectric and ground electrode enclosing the powered electrode so that the powered electrode is suspended within the dielectric;
a first microwave generator electrically coupled to the first end of the powered electrode through a first feed; and
a second microwave generator electrically coupled to the second end of the powered electrode through a second feed.