US 12,224,153 B2
Electron microscope
Shuai Li, Beijing (CN)
Assigned to FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD., Beijing (CN)
Appl. No. 17/758,363
Filed by FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD., Beijing (CN)
PCT Filed Dec. 3, 2021, PCT No. PCT/CN2021/135541
§ 371(c)(1), (2) Date Jul. 5, 2022,
PCT Pub. No. WO2022/083789, PCT Pub. Date Apr. 28, 2022.
Claims priority of application No. 202011393110.0 (CN), filed on Dec. 2, 2020.
Prior Publication US 2023/0028903 A1, Jan. 26, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/24 (2006.01); H01J 37/14 (2006.01); H01J 37/147 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/244 (2013.01) [H01J 37/147 (2013.01); H01J 37/261 (2013.01); H01J 37/28 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An electron microscope, comprising:
an electron source, configured to generate an electron beam;
a first beam guide, configured to accelerate the electron beam;
a second beam guide, configured to accelerate the electron beam;
a first detector arranged between the first beam guide and the second beam guide, configured to receive secondary electrons generated by the electron beam acting on a specimen to be tested; and
a control electrode arranged between the first detector and an optical axis of the electron beam, configured to change movement directions of backscattered electrons and the secondary electrons generated by the electron beam acting on the specimen to be tested.