US 12,224,151 B2
Open microfocus x-ray source and control method thereof
Xiaojun Qiu, Wuxi (CN); Wenwen Kong, Wuxi (CN); Wei Zhang, Wuxi (CN); Liucheng Wang, Wuxi (CN); and Qi Hou, Wuxi (CN)
Assigned to Wuxi Unicomp Technology Co., Ltd., Wuxi (CN)
Filed by Wuxi Unicomp Technology Co., Ltd., Wuxi (CN)
Filed on Dec. 22, 2021, as Appl. No. 17/558,628.
Claims priority of application No. 202111006063.4 (CN), filed on Aug. 30, 2021.
Prior Publication US 2023/0069290 A1, Mar. 2, 2023
Int. Cl. H01J 35/14 (2006.01); H05G 1/46 (2006.01); H05G 1/52 (2006.01); H01J 35/06 (2006.01); H01J 35/08 (2006.01)
CPC H01J 35/147 (2019.05) [H05G 1/52 (2013.01); H01J 35/064 (2019.05); H01J 35/112 (2019.05); H05G 1/46 (2013.01)] 13 Claims
OG exemplary drawing
 
1. An open microfocus X-ray source, comprising:
an open X-ray tube, wherein the open X-ray tube comprises a cathode system, a deflection system and a focusing system, the cathode system is configured to emit an electron beam, the deflection system is configured to provide a deflection magnetic field for the electron beam, and the focusing system is configured to focus the electron beam to bombard an anode target to emit an X-ray;
a high voltage power supply (HVPS) system, wherein the HVPS system is configured to provide an emission current I0, an accelerating high voltage U0 and a grid voltage UG for the electron beam;
a vacuum system, wherein the vacuum system is configured to perform vacuumization; and
a control system, wherein the control system is configured to control, according to a spot size of the electron beam for bombarding the anode target, the HVPS system to adjust the emission current I0, the accelerating high voltage U0, a deflection coil current IXY of the deflection system, and a focusing coil current IF of the focusing system, wherein the spot size meets a preset requirement,
wherein the cathode system comprises a filament; and the control system is further configured to:
turn on the open X-ray tube at a minimum accelerating high voltage when receiving a power-on instruction:
gradually increase the accelerating high voltage Ue to a first maximum value at a preset compensation:
calibrate the filament; and
center the electron beam according to the deflection coil current IXY of the deflection system and an anode current IT of the anode target,
wherein the deflection system comprises a first deflection coil and a second deflection coil, wherein the first deflection coil and the second deflection coil are configured to generate a magnetic field respectively in an X direction and a Y direction on a plane perpendicular to a traveling direction of the electron beam, the X direction is perpendicular to the Y direction, and the deflection coil current IXY comprises a first deflection current IX and a second deflection current IY; and
the control system centers the electron beam according to the deflection coil current IXY of the deflection system and the anode current IT of the anode target by the following specific steps:
providing the first deflection current IX for the first deflection coil, scanning the first deflection current IX from a negative value to a positive value to obtain the anode current IT flowing through the anode target until the anode current IT reaches a second maximum value, and keeping the first deflection current IX unchanged; and
providing the second deflection current IY for the second deflection coil, and scanning the second deflection current IY from a negative value to a positive value to obtain the anode current IT flowing through the anode target until the anode current IT reaches a third maximum value.