US 12,224,149 B2
Ion source for controlling decomposition buildup using chlorine co-gas
Mateo Navarro Goldaraz, Cambridge, MA (US); Graham Wright, Newburyport, MA (US); and Ori Noked, Brookline, MA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jan. 20, 2023, as Appl. No. 18/099,353.
Prior Publication US 2024/0249904 A1, Jul. 25, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 27/02 (2006.01); H01J 27/26 (2006.01)
CPC H01J 27/022 (2013.01) [H01J 27/26 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An indirectly heated cathode ion source, comprising:
an arc chamber, comprising a plurality of walls;
an indirectly heated cathode disposed in the arc chamber;
a first valve in communication with the arc chamber and a first gas source, wherein the first gas source comprises a first gas that is an organoaluminium compound;
a second valve in communication with the arc chamber and a second gas source, wherein the second gas source comprises a second gas, different from the first gas and that is a chlorine containing gas; and
a controller in communication with the first valve and the second valve so as to limit a buildup of molecular byproducts created by decomposition of the first gas.