US 12,222,362 B2
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
Yoonbum Nam, Seoul (KR); Namkyun Kim, Pyeongtaek-si (KR); Seungbo Shim, Seoul (KR); Donghyeon Na, Hwaseong-si (KR); Naohiko Okunishi, Hwaseong-si (KR); Dongseok Han, Daegu (KR); Minyoung Hur, Hwaseong-si (KR); Byeongsang Kim, Hwaseong-si (KR); and Kuihyun Yoon, Yongin-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on May 18, 2022, as Appl. No. 17/747,303.
Claims priority of application No. 10-2021-0114244 (KR), filed on Aug. 27, 2021.
Prior Publication US 2023/0060400 A1, Mar. 2, 2023
Int. Cl. G01N 9/24 (2006.01); H01Q 1/40 (2006.01); H01Q 9/30 (2006.01)
CPC G01N 9/24 (2013.01) [H01Q 1/40 (2013.01); H01Q 9/30 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An apparatus for measuring parameters of plasma, the apparatus comprising:
a cutoff probe; and
at least one processor configured to provide, to the cutoff probe, a signal for measuring the parameters of the plasma in a plasma processing apparatus,
wherein the cutoff probe comprises:
a first antenna having a line shape and configured to emit a microwave to the plasma in response to the signal provided by the at least one processor;
a second antenna having a line shape and configured to generate an electrical signal in response to receiving the microwave that has been emitted by the first antenna and transferred through the plasma;
a first signal line connecting the first antenna to the at least one processor;
a second signal line connecting the second antenna to the at least one processor;
a first insulating layer covering the first signal line;
a second insulating layer covering the second signal line;
a first shield covering the first insulating layer;
a second shield covering the second insulating layer;
an end protection layer covering an end of each of the first insulating layer, the second insulating layer, the first shield, and the second shield;
a first antenna protection layer comprising a first insulating material and covering the first antenna, wherein the first antenna protection layer includes a first insulating portion and a second insulating portion, and wherein: i) the first insulating portion is in contact with a side surface of the first antenna, and ii) the second insulating portion is in contact with an end of the first antenna; and
a second antenna protection layer comprising a second insulating material and covering the second antenna.