| CPC C23C 16/45504 (2013.01) [C23C 16/45591 (2013.01); C23C 16/46 (2013.01); F15D 1/06 (2013.01)] | 20 Claims |

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1. A flange assembly for introducing at least one gas into a chemical vapor deposition chamber, the flange assembly comprising:
a flange body disposed proximate a chemical vapor deposition process chamber, wherein the flange body defines a length and has an interior surface and an exterior surface;
a plurality of outlet tubes disposed on the interior surface of the flange body; and
a plurality of inlet tubes disposed on the exterior surface of the flange body, each inlet tube having a first end and a second end, wherein each inlet tube is in fluid communication with a corresponding outlet tube via the second end of the inlet tube, wherein the first end of each inlet tube is configured to be connected to a supply of the at least one gas,
wherein each outlet tube is configured to output the at least one gas into the chemical vapor deposition chamber for conducting a chemical vapor deposition process, and
wherein the plurality of inlet tubes extends radially outward from the exterior surface of the flange body.
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