US 12,221,684 B2
Mask plate and manufacturing method thereof
Shanshan Bai, Beijing (CN)
Assigned to BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Appl. No. 16/770,183
Filed by BOE Technology Group Co., Ltd., Beijing (CN)
PCT Filed Nov. 12, 2019, PCT No. PCT/CN2019/117513
§ 371(c)(1), (2) Date Apr. 22, 2021,
PCT Pub. No. WO2020/098645, PCT Pub. Date May 22, 2020.
Claims priority of application No. 201811338402.7 (CN), filed on Nov. 12, 2018.
Prior Publication US 2021/0301386 A1, Sep. 30, 2021
Int. Cl. C23C 14/04 (2006.01); C23C 14/24 (2006.01)
CPC C23C 14/042 (2013.01) [C23C 14/24 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A mask plate, comprising at least one pattern region, each of the at least one pattern region comprises a first opening region and a second opening region adjacent to each other in a lengthwise direction of mask plate, each of the first opening region and the second opening region has a plurality of pattern openings penetrating through the mask plate along a thickness direction of the mask plate, wherein, a ratio of a sum of areas of the pattern openings in the second opening region to a total area of the second opening region is greater than a ratio of a sum of areas of the pattern openings in the first opening region to a total area of the first opening region, and the first opening region has grooves not penetrating through the mask plate in the thickness direction of the mask plate, and wherein
except for at a boundary between the first opening region and the second opening region, expansion-contraction ratios at any position of the first opening region in a first direction and a second direction of the mask plate are respectively different from expansion-contraction ratios at any position of the second opening region in the first direction and the second direction of the mask plate, wherein the first direction is a direction along which the first opening region and the second opening region are arranged, and the second direction is a direction orthogonal to the first direction.