	US 12,221,456 B2
	Metal complexes having triazenido ligands and uses thereof for depositing metals from the gas phase
Joerg Sundermeyer, Marburg (DE); Susanne Pulz, Marburg (DE); and Fabian Schroeder, Hameln (DE)
Assigned to Umicore AG & Co. KG, Hanau-Wolfgang (DE)
Appl. No. 16/771,867
Filed by Umicore AG & Co. KG, Hanau-Wolfgang (DE)
PCT Filed Dec. 12, 2018, PCT No. PCT/EP2018/084628 § 371(c)(1), (2) Date Jul. 13, 2020, PCT Pub. No. WO2019/115646, PCT Pub. Date Jun. 20, 2019.
Claims priority of application No. 17207806 (EP), filed on Dec. 15, 2017.
Prior Publication US 2020/0392171 A1, Dec. 17, 2020
Int. Cl. C23C 16/18 (2006.01); C07F 1/08 (2006.01); C07F 5/00 (2006.01); C07F 5/06 (2006.01); C07F 15/00 (2006.01); C07F 15/06 (2006.01)

CPC C07F 15/0053 (2013.01) [C07F 1/08 (2013.01); C07F 5/00 (2013.01); C07F 5/003 (2013.01); C07F 5/069 (2013.01); C07F 15/065 (2013.01); C23C 16/18 (2013.01)]

10 Claims

1. Method for the production of coated substrates, comprising the steps of:

a) providing a metal complex having at least one ligand L with the formula R¹—N₃—R², wherein R¹and R²are hydrocarbon radicals, for depositing the metal or a compound of the metal from the gas phase, and

b) depositing the metal or a compound of the metal on the surface of the substrate by metal-organic vapor deposition,

wherein the metal is selected from In, Co, Cu, Al, Ga, Tl and La, and

wherein the metal complex decomposes in the gas phase at a temperature which is not more than 100° C. above the sublimation temperature or evaporation temperature, wherein the metal complex of formula (2):

M[(L¹)_aX_d] (2)

wherein

L¹has the formula R¹—N₃—R², wherein R¹and R²are alkyl radicals with 1 to 12 C atoms,

X is selected from H, halogen, CO and alkyl having 1 to 6 C atoms,

a=3,

d=0 or 1.