| CPC B22F 10/36 (2021.01) [B22F 3/087 (2013.01); B22F 12/43 (2021.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12)] | 15 Claims |

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1. Deposition equipment for selectively depositing at least one particle by shockwave-induced spraying onto a deposition surface of a receiver substrate, said equipment comprising: at least one laser source configured to emit a laser beam, said laser beam being made up of a series of light pulses; a substrate carrier to which the substrate is fastened; a shockwave-generating layer comprising a first surface that is oriented toward the laser beam and a second surface that is oriented toward the deposition surface of the substrate; an optical system for directing and focusing said laser beam toward a focal region of the first surface of the generating layer; said second surface comprising a plurality of cavities, each of the cavities housing at least one particle; and said laser beam configured to generate a plasma in the focal region on the first surface of the generating layer and a shockwave that propagates within the generating layer from the first surface to the second surface of the generating layer to eject the at least one particle in the direction of the deposition surface of the receiver substrate.
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