US 12,220,421 B2
Inhibitors of C. difficile spore germination
Ernesto Abel-Santos, Las Vegas, NV (US); Steven Firestine, Livonia, MI (US); Shiv Sharma, Canton, MI (US); Angel Schilke, Saline, MI (US); Christopher Yip, Emeryville, CA (US); and Jacqueline Phan, Las Vegas, NV (US)
Assigned to THE BOARDS OF REGENTS OF THE NEVADA SYSTEM OF HIGHER EDUCATION ON BEHALF OF THE UNIVERSITY OF NEVADA, LAS, Las Vegas, NV (US); and THE BOARD OF GOVERNORS OF WAYNE STATE UNIVERSITY, Detroit, MI (US)
Filed by Ernesto Abel-Santos, Las Vegas, NV (US); Steven Firestine, Livonia, MI (US); Shiv Sharma, Canton, MI (US); Angel Schilke, Saline, MI (US); Christopher Yip, Emeryville, CA (US); and Jacqueline Phan, Las Vegas, NV (US)
Filed on Sep. 9, 2022, as Appl. No. 17/941,611.
Claims priority of provisional application 63/319,079, filed on Mar. 11, 2022.
Claims priority of provisional application 63/242,343, filed on Sep. 9, 2021.
Prior Publication US 2023/0130602 A1, Apr. 27, 2023
Int. Cl. A61K 31/575 (2006.01); A61K 9/16 (2006.01); A61K 47/06 (2006.01); A61K 47/55 (2017.01); A61P 31/04 (2006.01)
CPC A61K 31/575 (2013.01) [A61K 9/16 (2013.01); A61K 47/06 (2013.01); A61K 47/551 (2017.08); A61P 31/04 (2018.01)] 18 Claims
OG exemplary drawing
 
1. A compound having a structure represented by a formula:

OG Complex Work Unit Chemistry
wherein each of R1, R2a, and R2b is independently selected from hydrogen and —OH; and
wherein Ar1 is a bicyclic heteroaryl having a structure represented by a formula selected from:

OG Complex Work Unit Chemistry
wherein Z1 is selected from —O— and —NR18—;
wherein R18, when present, is selected from hydrogen and C1-C4 alkyl;
wherein each of Q1, Q2, Q3, and Q4 is independently selected from —N═ and —CR20═;
wherein each occurrence of R20 is independently selected from hydrogen, halogen, C1-C4 alkyl, C1-C4 alkoxy, and phenyl; and
wherein R10 is selected from hydrogen, halogen, C1-C4 alkyl, C1-C4 alkoxy, C1-C4 haloalkyl, C1-C4 thioalkyl, and phenyl substituted with 0, 1, 2, or 3 groups independently selected from halogen, —CN, —NH2, —OH, —NO2, C1-C4 alkyl, C2-C4 alkenyl, C1-C4 haloalkyl, C1-C4 cyanoalkyl, C1-C4 hydroxyalkyl, C1-C4 haloalkoxy, C1-C4 alkoxy, C1-C4 alkylamino, (C1-C4)(C1-C4) dialkylamino, and C1-C4 aminoalkyl,
or a pharmaceutically acceptable salt thereof.