US 12,219,797 B2
Display device including a frame-like shape oxide semiconductor layer
Tohru Sonoda, Sakai (JP); Takashi Ochi, Sakai (JP); and Jumpei Takahashi, Sakai (JP)
Assigned to SHARP KABUSHIKI KAISHA, Sakai (JP)
Appl. No. 17/442,567
Filed by SHARP KABUSHIKI KAISHA, Sakai (JP)
PCT Filed Mar. 26, 2019, PCT No. PCT/JP2019/012940
§ 371(c)(1), (2) Date Sep. 23, 2021,
PCT Pub. No. WO2020/194526, PCT Pub. Date Oct. 1, 2020.
Prior Publication US 2022/0190291 A1, Jun. 16, 2022
Int. Cl. H10K 50/84 (2023.01); H10K 50/844 (2023.01); H10K 59/12 (2023.01); H10K 59/121 (2023.01); H10K 59/65 (2023.01); H10K 71/00 (2023.01); H10K 77/10 (2023.01); H10K 50/15 (2023.01); H10K 50/16 (2023.01); H10K 50/17 (2023.01); H10K 102/00 (2023.01)
CPC H10K 50/844 (2023.02) [H10K 59/121 (2023.02); H10K 59/65 (2023.02); H10K 71/00 (2023.02); H10K 77/111 (2023.02); H10K 50/15 (2023.02); H10K 50/16 (2023.02); H10K 50/17 (2023.02); H10K 50/171 (2023.02); H10K 59/12 (2023.02); H10K 59/1201 (2023.02); H10K 59/1216 (2023.02); H10K 2102/311 (2023.02)] 17 Claims
OG exemplary drawing
 
1. A display device comprising:
a resin substrate;
a thin film transistor layer provided on the resin substrate and including a first inorganic insulating film;
a light-emitting element layer provided on the thin film transistor layer and including a plurality of light-emitting elements arranged corresponding to a plurality of subpixels of a display region; and
a sealing film provided on the light-emitting element layer to cover the plurality of light-emitting elements and including a second inorganic insulating film, wherein
a frame region is provided around the display region,
a non-display region is provided in an island shape within the display region,
a through hole penetrating in a thickness direction of the resin substrate is provided in the non-display region,
a first electrode, a functional layer, and a second electrode are sequentially layered in each of the plurality of light-emitting elements,
the functional layer includes a common functional layer provided in common to the plurality of subpixels,
an oxide semiconductor layer is provided in a frame-like shape along a peripheral edge of the through hole in the non-display region,
a first opening is provided in the first inorganic insulating film to surround the through hole in a plan view and to expose the oxide semiconductor layer in the non-display region,
the common functional layer is provided to extend from the display region to the non-display region,
a second opening is provided in a frame-like shape to surround the through hole in the plan view and to expose the oxide semiconductor layer in the common functional layer, and
the second inorganic insulating film is in contact with the oxide semiconductor layer via the second opening.