US 12,219,796 B2
Display substrate having a blocking dam provided with at least one groove and manufacturing method therefor, and display device
Bingwei Yang, Beijing (CN); and Mingxing Li, Beijing (CN)
Assigned to MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Appl. No. 17/420,104
Filed by MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
PCT Filed Aug. 4, 2020, PCT No. PCT/CN2020/106870
§ 371(c)(1), (2) Date Jun. 30, 2021,
PCT Pub. No. WO2021/023189, PCT Pub. Date Feb. 11, 2021.
Claims priority of application No. 201910722165.2 (CN), filed on Aug. 6, 2019.
Prior Publication US 2022/0085330 A1, Mar. 17, 2022
Int. Cl. H10K 50/844 (2023.01); H10K 59/12 (2023.01); H10K 59/122 (2023.01); H10K 59/124 (2023.01); H10K 71/00 (2023.01); H10K 71/20 (2023.01)
CPC H10K 50/844 (2023.02) [H10K 59/122 (2023.02); H10K 59/124 (2023.02); H10K 71/00 (2023.02); H10K 71/233 (2023.02); H10K 59/1201 (2023.02)] 12 Claims
OG exemplary drawing
 
1. A display substrate having an active area and a frame area located at at least one side of the active area, the display substrate comprising:
a substrate;
pixel units disposed on the substrate and located in the active area;
an isolation column located in the active area;
a pixel defining layer located in the active area;
a planarization layer covering at least the active area;
a plurality of light-emitting devices arranged in an array in the active area;
at least one blocking dam disposed on the substrate and located in the frame area, at least one groove being provided on a surface of the at least one blocking dam facing away from the substrate;
a depth direction of the at least one groove being perpendicular to the substrate, and an extending direction of the at least one groove being substantially the same as an extending direction of the at least one blocking dam provided with the at least one groove;
a conductive pattern located in the frame area; and
a first encapsulation layer covering the at least one blocking dam;
wherein the plurality of light-emitting devices are located between the first encapsulation layer and the substrate, each light-emitting device includes a first electrode, a light-emitting functional layer and a second electrode that are sequentially stacked on the planarization layer, and the light-emitting functional layer of each light-emitting device is located in an opening of the pixel defining layer; and
the conductive pattern and the first electrode of each light-emitting device are disposed in the same layer and have the same material, and an edge of an orthogonal projection of the conductive pattern on the substrate away from the active area is located within a range of an orthogonal projection of the at least one blocking dam on the substrate;
wherein the at least one blocking dam provided with the at least one groove includes a second pattern layer and a first pattern layer that are sequentially stacked on the substrate, a material of the first pattern layer is different from a material of the second pattern layer, and the at least one groove is located in the first pattern layer;
the isolation column and the first pattern layer being formed by patterning the same film layer; and
the pixel defining layer and the second pattern layer being formed by patterning the same film layer;
wherein the at least one blocking dam further includes a third pattern layer between the second pattern layer and the substrate, and the planarization layer and the third pattern layer are formed by patterning the same film layer; and
an orthogonal projection of the conductive pattern on the substrate is overlapped with an orthogonal projection of the third pattern layer on the substrate, and is not overlapped with orthogonal projections of the second pattern layer and the first pattern layer on the substrate.