US 12,218,153 B2
Display device and manufacturing method thereof
Wen-Ching Sung, Hsinchu (TW); and Wei-Hung Kuo, Hsinchu (TW)
Assigned to Au Optronics Corporation, Hsinchu (TW)
Filed by Au Optronics Corporation, Hsinchu (TW)
Filed on Jun. 27, 2021, as Appl. No. 17/359,636.
Claims priority of application No. 109146506 (TW), filed on Dec. 28, 2020.
Prior Publication US 2022/0208802 A1, Jun. 30, 2022
Int. Cl. H01L 27/12 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); H01L 21/311 (2006.01); H01L 25/16 (2023.01); H01L 33/38 (2010.01)
CPC H01L 27/1248 (2013.01) [G03F 7/0007 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/31133 (2013.01); H01L 25/167 (2013.01); H01L 27/1259 (2013.01); H01L 33/385 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A display device, comprising a display area and a non-display area, wherein the display device comprises:
a substrate;
an element layer disposed on the substrate;
an electrode pattern layer disposed on the element layer, wherein the electrode pattern layer comprises a plurality of electrodes;
a photoresist pattern layer disposed on the electrode pattern layer and comprising:
a first photoresist pattern disposed corresponding to the display area and corresponding to the plurality of the electrodes, and
a second photoresist pattern disposed corresponding to the non-display area and between the plurality of the electrodes; and
at least one light-emitting element disposed on the photoresist pattern layer and electrically connected to the plurality of the electrodes of the electrode pattern layer,
wherein a height of the first photoresist pattern is equal to a height of the second photoresist pattern, and the light-emitting element is disposed on a plane of the photoresist pattern layer formed by the first photoresist pattern and the second photoresist pattern.