US 12,218,072 B2
Semiconductor device and method for manufacturing the same
Yoichi Mizuta, Yokohama Kanagawa (JP); Takahiro Tsurudo, Yokohama Kanagawa (JP); Yoshiaki Takahashi, Yokohama Kanagawa (JP); Kenichi Matoba, Yokohama Kanagawa (JP); Yoshifumi Shimamura, Yokohama Kanagawa (JP); Toru Ozawa, Kamakura Kanagawa (JP); Takumi Kosaki, Kamakura Kanagawa (JP); and Kouji Nakao, Yokohama Kanagawa (JP)
Assigned to KIOXIA CORPORATION, Tokyo (JP)
Filed by Kioxia Corporation, Tokyo (JP)
Filed on Aug. 25, 2021, as Appl. No. 17/412,022.
Claims priority of application No. 2021-032632 (JP), filed on Mar. 2, 2021.
Prior Publication US 2022/0285284 A1, Sep. 8, 2022
Int. Cl. H01L 23/544 (2006.01); H01L 21/66 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01)
CPC H01L 23/544 (2013.01) [H01L 21/768 (2013.01); H01L 22/12 (2013.01); H01L 23/5226 (2013.01); H01L 23/528 (2013.01); H01L 22/32 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54433 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a circuit pattern including a plurality of unit patterns that are disposed in a repeating manner in a first direction; and
a discrimination pattern provided in the circuit pattern and configured to discriminate the plurality of unit patterns from each other,
wherein the discrimination pattern has a corresponding one of a plurality of discrimination figures different from each other, and each of the plurality of discrimination figures corresponds to a respective one of the plurality of unit patterns,
wherein the plurality of discrimination figures are arranged along a second direction, which is different from the first direction, and respective lengths of the plurality of discrimination figures in the second direction are different from each other.