| CPC H01L 21/76895 (2013.01) [H01L 21/76898 (2013.01); H01L 21/77 (2013.01); H01L 23/528 (2013.01); H01L 24/03 (2013.01); H01L 24/06 (2013.01); H01L 25/18 (2013.01); H01L 23/4006 (2013.01); H01L 2023/4087 (2013.01); H01L 2224/02372 (2013.01); H01L 2224/02379 (2013.01); H01L 2224/06182 (2013.01); H01L 2224/16145 (2013.01)] | 20 Claims |

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1. A method comprising:
forming a plurality of semiconductor dies at least partially within a semiconductor substrate;
forming a first local interconnect adjacent to a first side of the semiconductor substrate, wherein the first local interconnect electrically couples a first semiconductor die of the plurality of semiconductor dies to a second semiconductor die of the plurality of semiconductor dies, the first local interconnect passing across a scribe region disposed between the first semiconductor die and the second semiconductor die; and
forming an integrated fan-out structure adjacent to a second side of the semiconductor substrate opposite the first side, wherein the integrated fan-out structure electrically couples a third semiconductor die of the plurality of semiconductor dies to the first semiconductor die of the plurality of semiconductor dies.
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