US 12,217,986 B2
Substrate treating apparatus with parallel first and second parts of substrate treatment lines on multiple stories for simultaneously treating a plurality of substrates
Hiroyuki Ogura, Kyoto (JP); Tsuyoshi Mitsuhashi, Kyoto (JP); Yoshiteru Fukutomi, Kyoto (JP); Kenya Morinishi, Kyoto (JP); Yasuo Kawamatsu, Kyoto (JP); and Hiromichi Nagashima, Kyoto (JP)
Assigned to SCREEN Semiconductor Solutions Co., Ltd., Kyoto (JP)
Filed by SCREEN Semiconductor Solutions Co., Ltd., Kyoto (JP)
Filed on Jan. 8, 2021, as Appl. No. 17/145,039.
Application 17/145,039 is a continuation of application No. 15/047,056, filed on Feb. 18, 2016, abandoned.
Application 15/047,056 is a continuation of application No. 12/343,292, filed on Dec. 23, 2008, granted, now 9,299,596, issued on Mar. 29, 2016.
Claims priority of application No. 2007-340428 (JP), filed on Dec. 28, 2007.
Prior Publication US 2021/0134626 A1, May 6, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/677 (2006.01); B05C 9/12 (2006.01); B05C 9/14 (2006.01); B05C 13/00 (2006.01); G03F 7/00 (2006.01); H01L 21/67 (2006.01); B05C 13/02 (2006.01); B05D 3/04 (2006.01); F24F 3/167 (2021.01)
CPC H01L 21/67225 (2013.01) [B05C 9/12 (2013.01); B05C 9/14 (2013.01); B05C 13/00 (2013.01); G03F 7/70841 (2013.01); H01L 21/67109 (2013.01); H01L 21/6715 (2013.01); H01L 21/67173 (2013.01); H01L 21/67178 (2013.01); H01L 21/6719 (2013.01); H01L 21/67196 (2013.01); H01L 21/67276 (2013.01); H01L 21/67742 (2013.01); H01L 21/67748 (2013.01); B05C 13/02 (2013.01); B05D 3/0486 (2013.01); F24F 3/167 (2021.01); H01L 2224/27618 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a plurality of substrate treatment lines configured to carry out plural types of treatment on substrates while transporting the substrates horizontally; and
a controller configured to change processes of treatment carried out on the substrates for each of the substrate treatment lines;
wherein the substrate treatment lines are arranged vertically;
wherein each of the substrate treatment lines includes:
a plurality of treating units; and
main transport mechanisms configured to transport the substrates to and from the treating units;
wherein the controller is arranged to cause a first part of the substrate treatment lines to treat the substrates in a process in a normal operation, and a second part of the substrate treatment lines to treat the substrates in a test run, the test run comprising testing, inspecting, checking or verifying treatment quality or testing the treating units;
wherein the process in the normal operation in the first part of the substrate treatment lines and the process in the test run in the second part of the substrate treatment lines are carried out in parallel;
the substrate treating apparatus further comprises an input unit configured to input information to set substrate transport paths to each of the substrate treatment lines, wherein the controller is arranged to change the substrate transport paths for each of the substrate treatment lines based on the information inputted to the input unit;
wherein the information inputted to the input unit is not set at the controller beforehand;
wherein the information inputted to the input unit is information identifying treating units subject to the test run; and
the controller is arranged to determine, based on the information identifying treating units subject to the test run, transport paths for transporting the substrates only to the treating units identified by the information identifying treating units subject to the test run.