US 12,217,939 B2
RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
David French, Fort Myers, FL (US); Vincent E. Burkhart, Cupertino, CA (US); Karl Frederick Leeser, West Linn, OR (US); and Liang Meng, Sherwood, OR (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Oct. 22, 2021, as Appl. No. 17/451,975.
Application 17/451,975 is a continuation of application No. 16/052,877, filed on Aug. 2, 2018, granted, now 11,183,368.
Prior Publication US 2022/0044909 A1, Feb. 10, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 16/455 (2006.01); H01L 21/683 (2006.01); H05B 1/02 (2006.01)
CPC H01J 37/32183 (2013.01) [C23C 16/45565 (2013.01); H01J 37/32458 (2013.01); H01J 37/32541 (2013.01); H01J 37/32568 (2013.01); H01J 37/32577 (2013.01); H01J 37/32697 (2013.01); H01J 37/32724 (2013.01); H01L 21/6833 (2013.01); H05B 1/02 (2013.01); H01J 2237/334 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A substrate processing system, the substrate processing system comprising:
a substrate support configured to support the substrate, wherein the substrate support comprises a first one or more electrodes; and
a first tuning circuit connected to the first one or more electrodes and a ground reference terminal and comprising:
a series impedance set comprising a first impedance and a second impedance connected in series with the first impedance, and
a parallel impedance set connected to the series impedance set and comprising a third impedance and a fourth impedance connected in parallel with the third impedance.