US 12,217,927 B2
Beam manipulation of advanced charge controller module in a charged particle system
Jian Zhang, San Jose, CA (US); Ning Ye, San Jose, CA (US); Zhiwen Kang, San Jose, CA (US); and Yixiang Wang, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/633,556
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Aug. 4, 2020, PCT No. PCT/EP2020/071942
§ 371(c)(1), (2) Date Feb. 7, 2022,
PCT Pub. No. WO2021/023752, PCT Pub. Date Feb. 11, 2021.
Claims priority of provisional application 62/884,631, filed on Aug. 8, 2019.
Prior Publication US 2022/0351932 A1, Nov. 3, 2022
Int. Cl. H01J 37/26 (2006.01); G02B 27/09 (2006.01); H01J 37/02 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/026 (2013.01) [G02B 27/0966 (2013.01); H01J 37/28 (2013.01); H01J 2237/0047 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An electron beam system, the system comprising:
an electron beam tool; and
an advanced charge controller (ACC) module comprising:
a laser source configured to emit a beam, and
a lens system configured to shape the emitted beam by manipulating a fan angle of the emitted beam in a tangential plane and a fan angle of the beam in a sagittal plane for illuminating an area on a wafer beneath the electron beam tool.