US 12,216,455 B2
Chamber component condition estimation using substrate measurements
Chunlei Zhang, Santa Clara, CA (US); Zhaozhao Zhu, Milpitas, CA (US); and Michael Kutney, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa clara, CA (US)
Filed on Jan. 25, 2022, as Appl. No. 17/584,318.
Prior Publication US 2023/0236583 A1, Jul. 27, 2023
Int. Cl. G05B 19/418 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01)
CPC G05B 19/41835 (2013.01) [G05B 19/4183 (2013.01); H01L 21/67276 (2013.01); H01L 22/26 (2013.01); G05B 2219/45031 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
processing a substrate in a process chamber of a substrate processing system, wherein the substrate comprises at least one of a film or a feature after the processing;
measuring a plurality of locations on the substrate using a substrate measurement system of the substrate processing system;
generating a profile map of at least one of the film or the feature on the substrate based on measurements of the plurality of locations on the substrate;
processing data from the profile map using a first trained machine learning model, wherein the first trained machine learning model outputs a first chamber component condition estimation for a first chamber component of the process chamber;
determining at least one of a deficiency or a degradation of the first chamber component based on the first chamber component condition estimation; and
determining whether to perform maintenance on the first chamber component of the process chamber based on at least one of the deficiency or the degradation of the first chamber component.