US 12,216,410 B2
Exposure apparatus and method of manufacturing article
Keiji Emoto, Saitama (JP); and Mamoru Kaneishi, Tochigi (JP)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Aug. 15, 2023, as Appl. No. 18/233,920.
Application 18/233,920 is a continuation of application No. 17/858,263, filed on Jul. 6, 2022, granted, now 11,762,299.
Claims priority of application No. 2021-115831 (JP), filed on Jul. 13, 2021.
Prior Publication US 2023/0393486 A1, Dec. 7, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70358 (2013.01) [G03F 7/70725 (2013.01); G03F 7/70758 (2013.01); G03F 7/70775 (2013.01)] 16 Claims
OG exemplary drawing
 
1. An exposure apparatus for performing scanning exposure on each of a plurality of shot regions in a substrate, comprising:
a stage configured to hold the substrate;
a driver configured to drive the stage; and
a controller configured to control the scanning exposure on each of the plurality of shot regions while controlling the driver in accordance with a driving profile for driving the stage,
wherein the driving profile includes a first constant acceleration section in which velocity of the stage is changed at a first constant acceleration in a first direction, a second constant acceleration section in which velocity of the stage is changed at a second constant acceleration in a second direction opposite to the first direction, and a connection section connecting the first constant acceleration section and the second constant acceleration section such that an acceleration of the stage in the connection section continuously changes,
in a period including at least a part of the connection section, the scanning exposure on one shot region among the plurality of shot regions is performed.