US 12,216,404 B2
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
Masafumi Kojima, Shizuoka (JP); Minoru Uemura, Shizuoka (JP); Takashi Kawashima, Shizuoka (JP); Akiyoshi Goto, Shizuoka (JP); Kei Yamamoto, Shizuoka (JP); Kazuhiro Marumo, Shizuoka (JP); and Keiyu Ou, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Nov. 29, 2020, as Appl. No. 17/106,170.
Application 17/106,170 is a continuation of application No. PCT/JP2019/026029, filed on Jul. 1, 2019.
Claims priority of application No. 2018-160287 (JP), filed on Aug. 29, 2018; and application No. 2019-072107 (JP), filed on Apr. 4, 2019.
Prior Publication US 2021/0088905 A1, Mar. 25, 2021
Int. Cl. G03F 7/039 (2006.01); C08L 33/10 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0392 (2013.01) [C08L 33/10 (2013.01); G03F 7/0382 (2013.01); G03F 7/32 (2013.01); G03F 7/20 (2013.01)] 5 Claims
 
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a photoacid generator A that generates an acid having a pKa of −1.00 or more;
one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and
an acid-decomposable resin,
wherein the actinic ray-sensitive or radiation-sensitive resin composition may further include a photoacid generator D that is a compound different from the nitrogen-containing compound C and generates an acid having a pKa of less than −1.00, and
in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes the photoacid generator D, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the actinic ray-sensitive or radiation-sensitive resin composition, is 1.0 or more,
wherein, the photoacid generator A is any one selected from the group consisting of PAG-4, PAG-6, PAG-11, PAG-14 to PAG-16, PAG-18 and PAG-20,

OG Complex Work Unit Chemistry