US 12,216,301 B2
Apparatuses and methods for inspecting embedded features
Jacob Chesna, Phoenix, AZ (US); Liang Zhang, Chandler, AZ (US); Jianyong Mo, Chandler, AZ (US); and Fan Fan, Chandler, AZ (US)
Assigned to Intel Corporation, Santa Clara, CA (US)
Filed by Intel Corporation, Santa Clara, CA (US)
Filed on Mar. 29, 2022, as Appl. No. 17/706,654.
Prior Publication US 2023/0314682 A1, Oct. 5, 2023
Int. Cl. G02B 5/30 (2006.01); G01L 1/24 (2006.01); G02B 5/20 (2006.01); G02B 5/26 (2006.01)
CPC G02B 5/3066 (2013.01) [G01L 1/248 (2013.01); G02B 5/208 (2013.01); G02B 5/26 (2013.01); G02B 5/305 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a light source configured to emit light to a translucent material and an embedded feature disposed in the translucent material;
a first linear polarizer configured to linearly polarize the emitted light, based on a first orientation of an optical axis of the first linear polarizer;
a second linear polarizer configured to filter the light that is reflected from the translucent material, from the light that is reflected from the embedded feature and the translucent material, based on a second orientation of an optical axis of the second linear polarizer; and
a sensor configured to:
receive the light reflected from the embedded feature, from which the light reflected from the translucent material is filtered; and
capture an image of the embedded feature and the translucent material, based on the received light.