US 12,216,277 B2
Optical element for deconvolution
Ernest Rehmatulla Post, San Francisco, CA (US)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Oct. 11, 2022, as Appl. No. 17/963,609.
Claims priority of provisional application 63/255,819, filed on Oct. 14, 2021.
Prior Publication US 2023/0119549 A1, Apr. 20, 2023
Int. Cl. G02B 27/00 (2006.01); G06T 5/20 (2006.01); G06T 5/73 (2024.01); H04N 23/53 (2023.01); H04N 23/55 (2023.01); H04N 23/95 (2023.01)
CPC G02B 27/0068 (2013.01) [G06T 5/20 (2013.01); G06T 5/73 (2024.01); H04N 23/53 (2023.01); G06T 2207/20021 (2013.01); G06T 2207/20212 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of constructing a corrective phase mask for a physical corrective optical element, comprising:
propagating, for each of one or more wavelengths, a point source field from an object plane to a corrective mask plane to determine a source field;
propagating, for each of the one or more wavelengths, the point source field from an image plane to the corrective mask plane to determine an image field;
determining, for each of the one or more wavelengths, a phase modulation field based on the source field and the image field;
determining a multi-wavelength phase modulation field based on combining the phase modulation field for each of the one or more wavelengths; and
constructing the physical corrective optical element based on the determined multi-wavelength phase modulation field to deblur distorted images without having to deconvolve the image computationally.