US 12,216,042 B2
Photoacoustic detecting device
Rolf Aidam, Wyhl (DE); Sébastien Barnola, Villard Bonnot (FR); Badhise Ben Bakir, Brézins (FR); Jean-Guillaume Coutard, Saint Pancrasse (FR); and Kevin Jourde, Grenoble (FR)
Assigned to ECLYPIA, Grenoble (FR); and COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
Filed by ECLYPIA, Grenoble (FR); and COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
Filed on Apr. 19, 2024, as Appl. No. 18/641,107.
Claims priority of application No. 23315088.7 (EP), filed on Apr. 20, 2023.
Prior Publication US 2024/0353317 A1, Oct. 24, 2024
Int. Cl. G01N 21/17 (2006.01); A61B 5/145 (2006.01); G01N 29/24 (2006.01)
CPC G01N 21/1702 (2013.01) [A61B 5/145 (2013.01); G01N 29/2418 (2013.01); G01N 29/2425 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A photoacoustic detecting device for measuring a parameter of interest in a medium to analyse, the photoacoustic detecting device comprising:
a housing comprising a cover and a baseplate, wherein the baseplate comprises an aperture, said housing being configured to house:
at least one lighting module configured to emit at least one light beam,
a photoacoustic cell, comprising a contact surface accessible from the aperture of the baseplate, said contact surface being intended to be placed in contact with the medium to analyse, the photoacoustic cell further comprising a photoacoustic cavity extending from the contact surface to a top of the photoacoustic cell, wherein said top and said surface contact are open,
at least one window closing the top of the photoacoustic cell or the contact surface of the photoacoustic cell,
at least one subwavelength pattern located on a surface of said window, said subwavelength pattern being configured to focus the light beam on a surface of interest of the medium to analyse,
a sensor, linked to the photoacoustic cavity, the sensor being configured to detect a generated signal, said generated signal being generated in the photoacoustic cavity by a photothermic effect in the medium to analyse in response to the irradiation of said medium by the light beam, and
wherein the photoacoustic cell, the window and the subwavelength pattern are formed on a single silicon wafer.