US 12,215,974 B2
Optical measurement apparatus, measuring method using the same, and method for fabricating semiconductor device using the same
Seung Woo Lee, Seoul (KR); Wook Rae Kim, Suwon-si (KR); Kwang Soo Kim, Osan-si (KR); Myung Jun Lee, Seongnam-si (KR); Seo Yeon Jeong, Yongin-si (KR); and Sung Ho Jang, Yongin-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Oct. 19, 2022, as Appl. No. 17/969,200.
Claims priority of application No. 10-2021-0179788 (KR), filed on Dec. 15, 2021.
Prior Publication US 2023/0184535 A1, Jun. 15, 2023
Int. Cl. G01B 9/02055 (2022.01); G01B 9/02 (2022.01); G01B 9/02001 (2022.01); G01B 9/02015 (2022.01); H01L 21/66 (2006.01)
CPC G01B 9/02063 (2013.01) [G01B 9/02011 (2013.01); G01B 9/0203 (2013.01); G01B 9/02083 (2013.01); G01B 2290/70 (2013.01); H01L 22/12 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An optical measurement apparatus comprising:
an optical system including an objective lens which generates a pupil image of a measurement target, using light;
a polarization generator which generates a polarized light from the light;
a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image;
a detector which detects the self-interference image; and
an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data,
wherein the polarization generator and the self-interference generator are both optically between the objective lens and the detector.