CPC C23C 16/45544 (2013.01) [C23C 16/458 (2013.01); C23C 16/52 (2013.01); H01J 37/32724 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/3321 (2013.01)] | 21 Claims |
1. A substrate support comprising:
a body configured to support a substrate during processing of the substrate, wherein the body comprises a plurality of plates comprising a top plate, a first intermediate plate, a second intermediate plate and a bottom plate, wherein the plurality of plates are arranged to form a stack, and wherein the first intermediate plate is disposed on the second intermediate plate; and
a thermal void defined by an upper recessed surface of the second intermediate plate and at least one of a lower recessed surface of the first intermediate plate or a lower recessed surface of the top plate, wherein the thermal void is annular-shaped.
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