US 12,215,418 B2
Apparatuses and method for oriented deposition
Ilkka Varjos, Espoo (FI); Anton Sergeevich Anisimov, Espoo (FI); Bjørn Fridur Mikladal, Helsinki (FI); and Dewei Tian, Kerava (FI)
Assigned to Canatu Finland Oy, Vantaa (FI)
Appl. No. 17/603,429
Filed by Canatu Finland Oy, Vantaa (FI)
PCT Filed Apr. 20, 2020, PCT No. PCT/FI2020/050259
§ 371(c)(1), (2) Date Oct. 13, 2021,
PCT Pub. No. WO2020/216988, PCT Pub. Date Oct. 29, 2020.
Claims priority of application No. 20195327 (FI), filed on Apr. 24, 2019.
Prior Publication US 2022/0195597 A1, Jun. 23, 2022
Int. Cl. C23C 16/455 (2006.01); C01B 32/15 (2017.01); C23C 16/06 (2006.01); C23C 16/26 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); C23C 24/04 (2006.01)
CPC C23C 16/45504 (2013.01) [C01B 32/15 (2017.08); C23C 16/06 (2013.01); C23C 16/26 (2013.01); C23C 16/4412 (2013.01); C23C 16/45591 (2013.01); C23C 16/52 (2013.01); C23C 24/04 (2013.01)] 28 Claims
OG exemplary drawing
 
1. An apparatus, comprising:
a deposition chamber elongated horizontally and comprising a top portion with a top cover and a bottom portion with a bottom cover,
a filter positioned horizontally in the deposition chamber separating the top portion from the bottom portion, wherein the filter comprises a deposition area,
an inlet arranged in the top portion of the deposition chamber and configured to provide a gas comprising high aspect ratio molecular structures, HARM-structures, into the deposition chamber,
an outlet arranged in the bottom portion of the deposition chamber and configured to collect gas from the deposition chamber, and
a control system configured to control gas flow at the inlet and the outlet, wherein
the inlet, the outlet and the filter are arranged to create a gas flow path for the gas comprising HARM-structures from the inlet in the top portion towards the outlet in the bottom portion and through the filter, wherein the direction of flow of the gas comprising HARM-structures in proximity to the deposition area of the filter is at least partially parallel to the filter; and wherein
the control system and the relative positions of the inlet, the outlet, the top cover, the bottom cover and the filter are arranged to maintain a laminar gas flow of the gas comprising HARM-structures in proximity to the deposition area of the filter.