US 12,215,414 B2
Shutter disc for a semiconductor processing tool
Yi-Lin Wang, Kaohsiung (TW); Chin-Szu Lee, Taoyuan (TW); Hua-Sheng Chiu, Zhudong Town (TW); Yi-Chao Chang, Hsinchu (TW); and Zih-Shou Mue, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Aug. 10, 2023, as Appl. No. 18/447,543.
Application 18/447,543 is a continuation of application No. 17/662,107, filed on May 5, 2022, granted, now 11,827,970.
Claims priority of provisional application 63/224,707, filed on Jul. 22, 2021.
Prior Publication US 2023/0383397 A1, Nov. 30, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/34 (2006.01); B08B 7/00 (2006.01); B08B 17/04 (2006.01); C23C 14/34 (2006.01); C23C 14/50 (2006.01); H01J 37/32 (2006.01)
CPC C23C 14/34 (2013.01) [B08B 7/0035 (2013.01); B08B 17/04 (2013.01); C23C 14/50 (2013.01); H01J 37/32724 (2013.01); H01J 37/32853 (2013.01); H01J 37/3441 (2013.01); H01J 37/3447 (2013.01); H01J 37/32082 (2013.01); H01J 2237/332 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A shutter disc for use in a physical vapor deposition (PVD) processing chamber, comprising:
a body, comprising:
a portion having a cross-sectional wave-shape and comprising:
a plurality of concentric crest portions, and
a plurality of concentric trough portions,
wherein a top surface of at least one concentric trough portion, of the plurality of concentric trough portions, is at an equal height with or below a backside surface of at least one concentric crest portion of the plurality of concentric crest portions.