US 12,215,221 B2
Material for forming organic film, method for forming organic film, patterning process, and compound
Daisuke Kori, Joetsu (JP); Takayoshi Nakahara, Joetsu (JP); Yusuke Biyajima, Joetsu (JP); and Kazumi Noda, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Nov. 5, 2020, as Appl. No. 17/090,783.
Claims priority of application No. 2019-236335 (JP), filed on Dec. 26, 2019.
Prior Publication US 2021/0198472 A1, Jul. 1, 2021
Int. Cl. C08L 33/16 (2006.01); C08L 33/06 (2006.01); C09D 171/12 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01)
CPC C08L 33/16 (2013.01) [C08L 33/066 (2013.01); C09D 171/12 (2013.01); G03F 7/0755 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/0274 (2013.01)] 18 Claims
 
1. A material for forming an organic film, comprising:
a compound shown by the following general formula (1); and
an organic solvent,

OG Complex Work Unit Chemistry
wherein X represents an organic group having a valency of n1 and 2 to 50 carbon atoms; n1 represents an integer of 2 to 10; and each of R1 is a group shown by any of the following general formulae (2) to (4), (16) and (17), and at least one of R1 is a group shown by any of general formulae (2) to (4),

OG Complex Work Unit Chemistry
wherein * represents a bonding site to the organic group X; Ra and Rb each represent a hydrogen atom, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms; Rc represents a hydrogen atom, a methyl group, or a phenyl group; m1 and m2 each represent an integer of 0 or 1; n2 and n3 each represent and satisfy a relation of n2+n3=2; and n4 represents an integer of 1 to 10,

OG Complex Work Unit Chemistry
wherein * represents a bonding site to the organic group X; Rd and Re each represent a hydrogen atom, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms; Rf represents a hydrogen atom, a methyl group, or a phenyl group; m3 and m4 each represent an integer of 0 or 1; n5 and n6 each represent and satisfy a relation of n5+n6=2; and l1 represents 0 or 1, when l1=1, a bridge structure is formed between aromatic rings via an oxygen atom as an ether bond, and when l1=0, no ether bond is present for forming the bridge structure between the aromatic rings, and

OG Complex Work Unit Chemistry
wherein * represents a bonding site to the organic group X; Rg and Rh each represent a hydrogen atom, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms; m5 and m6 each represent an integer of 0 or 1; n7 and n8 each represent an integer of 1 to 7, and satisfy a relation of n7+n8=2; and l2 represents 0 or 1, when l2=1, a bridge structure is formed between aromatic rings via an oxygen atom as an ether bond, and when l2=0, no ether bond is present for forming the bridge structure between the aromatic rings,

OG Complex Work Unit Chemistry
wherein R2 represents a linear, branched, or cyclic, saturated or unsaturated hydrocarbon group having 1 to 30 carbon atoms; and a methylene group constituting the R2 group is optionally substituted with an oxygen atom or a carbonyl group, and

OG Complex Work Unit Chemistry
wherein R3 represents a hydrogen atom, or a linear or branched hydrocarbon group having 1 to 10 carbon atoms; R4 represents a linear or branched hydrocarbon group having 1 to 10 carbon atoms, a halogen atom, a nitro group, an amino group, a nitrile group, an alkoxycarbonyl group having 1 to 10 carbon atoms, or an alkanoyloxy group having 1 to 10 carbon atoms; n11 represents any of 0 to 2; and n12 and n13 each represent the number of substituents on an aromatic ring, n12 represents 0 or 1, n13 represents an integer of 0 to 7, and n12+n13 is 0 or more and 7 or less.