US 12,214,493 B2
Optical manipulation apparatus
Oksana Shramkova, Liffré (FR); Laurent Blonde, Thorigné-Fouillard (FR); Valter Drazic, Betton (FR); and Mitra Damghanian, Cesson-Sévigné (FR)
Assigned to INTERDIGITAL CE PATENT HOLDINGS, SAS, Paris (FR)
Appl. No. 17/415,561
Filed by InterDigital CE Patent Holdings, SAS, Paris (FR)
PCT Filed Dec. 10, 2019, PCT No. PCT/EP2019/084526
§ 371(c)(1), (2) Date Jun. 17, 2021,
PCT Pub. No. WO2020/126708, PCT Pub. Date Jun. 25, 2020.
Claims priority of application No. 18213584 (EP), filed on Dec. 18, 2018.
Prior Publication US 2022/0059250 A1, Feb. 24, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. B25J 7/00 (2006.01); G02B 3/00 (2006.01); G02B 21/32 (2006.01); G02B 27/56 (2006.01); G02F 1/29 (2006.01)
CPC B25J 7/00 (2013.01) [G02B 3/0043 (2013.01); G02B 21/32 (2013.01); G02B 27/56 (2013.01); G02F 1/29 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A device configured to radiate a focused electromagnetic beam in a dielectric host medium having a first refractive index n1 when an incoming electromagnetic wave illuminates a first face of the device, wherein the device comprises:
a first material having a second refractive index n2 and having a first width W1 along a first direction of extension of the first face; and
a second material in contact with the first material and having a third refractive index n3, wherein the second material has a second width W2 along the first direction,
where n1<n3<n2, and where W1+W2 is greater than a wavelength λ in the host medium of the incoming electromagnetic wave, the first material and the second material extending along a second direction orthogonal to the first face from the first face up to a radiating face of each material, opposite to the first face, the first material and the second material having respectively a first height H1 and a second height H2 along the second direction, where |H2−H1|≤λ/4;
wherein the device comprises, when the device is in contact with the dielectric host medium and when the incoming electromagnetic wave illuminates the first face:
a first contact area between the dielectric host medium and the first material, the first contact area radiating a first jet beam in a near field zone;
a second contact area between the first material and the second material, the second contact area radiating a second jet beam in the near field zone; and
a third contact area between the second material and the dielectric host medium, the third contact area radiating a third jet beam in the near field zone,
wherein the focused electromagnetic beam results from a combination of at least two beams among the first jet beam, the second jet beam, and the third jet beam, wherein a direction of propagation of the focused electromagnetic beam is tilted with respect to a direction of propagation of the incoming electromagnetic wave.