US 12,214,468 B2
Temperature control of chemical mechanical polishing
Haosheng Wu, San Jose, CA (US); Hari Soundararajan, Sunnyvale, CA (US); Yen-Chu Yang, Santa Clara, CA (US); Jianshe Tang, San Jose, CA (US); Shou-Sung Chang, Mountain View, CA (US); Shih-Haur Shen, Sunnyvale, CA (US); and Taketo Sekine, Cupertino, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 13, 2018, as Appl. No. 16/189,968.
Claims priority of provisional application 62/586,086, filed on Nov. 14, 2017.
Prior Publication US 2019/0143476 A1, May 16, 2019
Int. Cl. B24B 49/14 (2006.01); B24B 37/015 (2012.01); B24B 37/10 (2012.01); B24B 49/02 (2006.01); B24B 49/04 (2006.01); B24B 55/02 (2006.01); B24B 57/02 (2006.01)
CPC B24B 37/015 (2013.01) [B24B 37/107 (2013.01); B24B 49/02 (2013.01); B24B 49/04 (2013.01); B24B 55/02 (2013.01); B24B 49/14 (2013.01); B24B 57/02 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A chemical mechanical polishing system, comprising:
a support to hold a polishing pad;
a carrier head to hold a substrate against the polishing pad during a polishing process;
an in-situ monitoring system configured to generate a signal having a value representative of a thickness of a layer on the substrate during the polishing process;
a temperature control system to control a temperature of a component selected from a surface of the polishing pad, a polishing liquid on the polishing pad, the substrate, or a combination thereof; and
a controller coupled to the in-situ monitoring system and the temperature control system, the controller configured to
store, prior to polishing, a continuous function that receives only the value representative of the thickness of the layer from the signal and outputs a desired temperature of the component based on the value representative of the thickness, wherein the continuous function is continuous across changes in the thickness of the layer of the substrate, and
cause the temperature control system to drive the temperature of the component toward the desired temperature output by the continuous function in response to the signal such that the desired temperature and the temperature of the component vary according to the thickness of the layer.