US D1,013,157 S
Mask filter
Tomoyuki Motegi, Tokyo (JP)
Assigned to KAO CORPORATION, Tokyo (JP)
Filed by KAO CORPORATION, Tokyo (JP)
Filed on Mar. 26, 2021, as Appl. No. 29/776,075.
Claims priority of application No. 2020-020785 D (JP), filed on Sep. 29, 2020.
Term of patent 15 Years
LOC (14) Cl. 29 - 02
U.S. Cl. D24—110.1
OG exemplary drawing
 
The ornamental design for a mask filter, as shown and described.