US D1,013,156 S
Mask filter
Tomoyuki Motegi, Tokyo (JP)
Assigned to KAO CORPORATION, Tokyo (JP)
Filed by KAO CORPORATION, Tokyo (JP)
Filed on Mar. 26, 2021, as Appl. No. 29/776,056.
Claims priority of application No. 2020-020783 D (JP), filed on Sep. 29, 2020; and application No. 2020-020784 D (JP), filed on Sep. 29, 2020.
Term of patent 15 Years
LOC (14) Cl. 29 - 02
U.S. Cl. D24—110.1
OG exemplary drawing
 
The ornamental design for a mask filter, as shown and described.