Kristy Lynn Barney, Lehi, UT (US); Mitchell Alan Cheever, Brigham City, UT (US); Yung Tseng Chen, San Francisco, CA (US); Thomas Crisp, Cottonwood Heights, UT (US); Desmond Kavanagh, Wicklow (IE); Hayley Ketch, Alpine, UT (US); Norman Stevenson, Dublin (IE); and Ildefonso M. Resuello, Jr., Sacramento, CA (US)
Assigned to Cricut, Inc., South Jordan, UT (US)
Filed by Cricut, Inc., South Jordan, UT (US)
Filed on Mar. 3, 2022, as Appl. No. 29/792,103.
Term of patent 15 Years
LOC (14) Cl. 02 - 03
U.S. Cl. D 2—892
The ornamental design for a hat form, as shown and described.
