US 11,889,743 B2
Evaporation method, evaporation mask assembly, display panel and display device
Xuwu Hu, Beijing (CN); Yangsheng Liu, Beijing (CN); Mengxia Kong, Beijing (CN); Donghui Si, Beijing (CN); Shan Mou, Beijing (CN); Yan Cui, Beijing (CN); and Yu Wang, Beijing (CN)
Assigned to CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Appl. No. 16/960,672
Filed by CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
PCT Filed Dec. 25, 2019, PCT No. PCT/CN2019/128286
§ 371(c)(1), (2) Date Jul. 8, 2020,
PCT Pub. No. WO2020/151448, PCT Pub. Date Jul. 30, 2020.
Claims priority of application No. 201910057935.6 (CN), filed on Jan. 22, 2019.
Prior Publication US 2021/0217955 A1, Jul. 15, 2021
Int. Cl. C23C 14/04 (2006.01); C23C 14/24 (2006.01); H10K 71/16 (2023.01); H10K 71/00 (2023.01); H10K 50/11 (2023.01); H10K 50/15 (2023.01); H10K 50/16 (2023.01)
CPC H10K 71/166 (2023.02) [C23C 14/042 (2013.01); C23C 14/24 (2013.01); H10K 71/00 (2023.02); H10K 71/164 (2023.02); H10K 50/11 (2023.02); H10K 50/15 (2023.02); H10K 50/16 (2023.02)] 12 Claims
OG exemplary drawing
 
1. An evaporation method, comprising:
performing a first evaporation on a base substrate by using a first mask to form a first evaporation sub-pattern on the base substrate, wherein the first mask has a first opening area; and
performing a second evaporation on the base substrate by using a second mask to form a second evaporation sub-pattern on the base substrate, wherein the second mask has a second opening area;
wherein a combination of the first and second evaporation sub-patterns forms an evaporation pattern;
wherein the first and second evaporation sub-patterns constitute complementary patterns; and
wherein the first and second evaporation sub-patterns are able to form an evaporation layer having an isolated hollow pattern.