US 11,887,881 B2
Lithographic apparatus, substrate table, and non-uniform coating method
Bruce Tirri, Brookfield, CT (US); Ping Zhou, Wilton, CT (US); Elizabeth Mary Stone, Stamford, CT (US); David Hart Peterson, Milford, CT (US); Mehmet Ali Akbas, Cheshire, CT (US); Ryan Mayer, Trumbull, CT (US); and Richard Bryan Lewis, Rye, NY (US)
Assigned to ASML HOLDING N.V., Veldhoven (NL)
Appl. No. 17/608,238
Filed by ASML HOLDING N.V., Veldhoven (NL)
PCT Filed Apr. 21, 2020, PCT No. PCT/EP2020/061098
§ 371(c)(1), (2) Date Nov. 2, 2021,
PCT Pub. No. WO2020/224953, PCT Pub. Date Nov. 12, 2020.
Claims priority of provisional application 62/844,384, filed on May 7, 2019.
Prior Publication US 2022/0216092 A1, Jul. 7, 2022
Int. Cl. G03F 7/00 (2006.01); H01L 21/687 (2006.01); C23C 16/513 (2006.01)
CPC H01L 21/68735 (2013.01) [C23C 16/513 (2013.01); G03F 7/707 (2013.01); G03F 7/70783 (2013.01); H01L 21/68757 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
supporting a table base, wherein the table base comprises a surface that is substantially flat; and
disposing a coating on the surface with a non-uniform thickness,
wherein the coating exerts a stress on the table base so as to bend the table base, and
wherein the non-uniform thickness causes a surface of the coating to become substantially flat after the bending.