CPC H01L 21/67034 (2013.01) [C23C 14/566 (2013.01); F26B 5/042 (2013.01); F26B 5/06 (2013.01)] | 18 Claims |
1. Vacuum arrangement, comprising:
a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another;
a substrate transfer chamber configured to change clocked substrate transport into continuous substrate transport towards the second dehydration chamber, wherein the substrate transfer chamber configured to change clocked substrate transport into continuous substrate transport comprises the substrate transfer chamber configured to change a noncontinuous movement speed of substrates transported within the chamber into a continuous movement speed;
a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber;
a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber, wherein the second high-vacuum pump comprises a gas-binding surface that is located within the second dehydration chamber,
wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber; and
a shield arranged within in the second dehydration chamber between the gas-binding surface and a substrate transport region of the second dehydration chamber.
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