US 11,886,110 B2
Imprinting apparatus
Timothy J. Merkel, Escondido, CA (US); Ruibo Wang, San Diego, CA (US); Daniel Wright, San Diego, CA (US); Danny Yuan Chan, San Diego, CA (US); Avishek Aiyar, San Diego, CA (US); Tanmay Ghonge, San Diego, CA (US); Neil Brahma, San Diego, CA (US); and Arthur Pitera, Encinitas, CA (US)
Assigned to Illumina, Inc., San Diego, CA (US)
Filed by ILLUMINA, INC., San Diego, CA (US)
Filed on Mar. 23, 2021, as Appl. No. 17/209,814.
Claims priority of provisional application 63/000,964, filed on Mar. 27, 2020.
Prior Publication US 2021/0302832 A1, Sep. 30, 2021
Int. Cl. G03F 7/00 (2006.01); B29C 59/02 (2006.01); C09D 183/14 (2006.01); G03F 7/16 (2006.01); B29K 83/00 (2006.01); B29K 105/00 (2006.01)
CPC G03F 7/0002 (2013.01) [B29C 59/022 (2013.01); C09D 183/14 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); B29K 2083/00 (2013.01); B29K 2105/0002 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method, comprising:
applying a formulation on a surface of a silicon master including a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features having a largest opening dimension being less than about 300 nm, the formulation including:
a first silane monomer:

OG Complex Work Unit Chemistry
 and
a second silane monomer including a hydrolyzable chloride group, the second silane monomer being present in an amount ranging from 0.001 wt % to less than about 1.4 wt % based on a total weight of silanes present in the formulation; and
curing the applied formulation, thereby forming an anti-stick layer.