US 11,885,912 B2
Sensor device
Yusuke Takatsuka, Kanagawa (JP); and Yoshiki Ebiko, Kanagawa (JP)
Assigned to SONY SEMICONDUCTOR SOLUTIONS CORPORATION, Kanagawa (JP)
Appl. No. 17/999,868
Filed by SONY SEMICONDUCTOR SOLUTIONS CORPORATION, Kanagawa (JP)
PCT Filed Apr. 20, 2021, PCT No. PCT/JP2021/016040
§ 371(c)(1), (2) Date Nov. 25, 2022,
PCT Pub. No. WO2021/251006, PCT Pub. Date Dec. 16, 2021.
Claims priority of application No. 2020-098996 (JP), filed on Jun. 7, 2020.
Prior Publication US 2023/0350028 A1, Nov. 2, 2023
Int. Cl. G01S 7/48 (2006.01); G01S 7/481 (2006.01); G01S 17/32 (2020.01); G01S 7/4915 (2020.01)
CPC G01S 7/4816 (2013.01) [G01S 7/4915 (2013.01); G01S 17/32 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A sensor device comprising a pixel that includes:
a photoelectric conversion element configured to perform photoelectric conversion;
a first charge holding unit and a second charge holding unit configured to hold charges accumulated in the photoelectric conversion element;
a first transfer transistor configured to transfer the charges to the first charge holding unit; and
a second transfer transistor configured to transfer the charges to the second charge holding unit,
wherein each of the first and second transfer transistors includes a vertical transistor including a vertical gate electrode portion, and
in each of the first and second transfer transistors, an oxide film thickness of an opposite side wall portion is made larger than an oxide film thickness of a transfer side wall portion, the opposite side wall portion is on a side opposite to the transfer side wall portion that is a wall portion on a side facing a transfer path of the charges among side wall portions of the vertical gate electrode portion.