US 11,885,608 B2
Ellipsometer and inspection device for inspecting semiconductor device having the same
Yasuhiro Hidaka, Yokohama (JP)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Jul. 2, 2021, as Appl. No. 17/366,936.
Claims priority of application No. 2020-115522 (JP), filed on Jul. 3, 2020; and application No. 10-2020-0138145 (KR), filed on Oct. 23, 2020.
Prior Publication US 2022/0003538 A1, Jan. 6, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G01B 11/06 (2006.01); G02B 27/28 (2006.01); G02B 5/30 (2006.01); G02B 5/04 (2006.01); G02B 27/14 (2006.01); G02B 3/06 (2006.01); G02B 27/30 (2006.01)
CPC G01B 11/06 (2013.01) [G02B 3/06 (2013.01); G02B 5/04 (2013.01); G02B 5/3025 (2013.01); G02B 27/141 (2013.01); G02B 27/283 (2013.01); G02B 27/286 (2013.01); G02B 27/30 (2013.01); G01B 2210/56 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An ellipsometer comprising:
a polarizing optical element, comprising a prism, that is configured to split reflected light into two linearly polarized components of light having polarization directions orthogonal to each other, the reflected light generated by reflecting illuminated light, including linearly polarized light that is polarized in one direction, from a measurement surface of a sample;
an interference member, comprising at least one body, that is configured to form at least one interference fringe in which the two linearly polarized components of light interfere with each other in directions different from the polarization directions;
an image detector configured to detect the at least one interference fringe; and
an analysis device comprising at least one processor, the analysis device configured to calculate ellipsometry coefficients Ψ and Δ based on the at least one interference fringe that is detected.