US 11,885,005 B2
Mask and manufacturing method therefor, and manufacturing method for display substrate
Chang Luo, Beijing (CN); Fengli Ji, Beijing (CN); Jianpeng Wu, Beijing (CN); and Zhongying Yang, Beijing (CN)
Assigned to Chengdu BOE Optoelectronics Technology Co., Ltd., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Appl. No. 16/963,673
Filed by Chengdu BOE Optoelectronics Technology Co., Ltd., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
PCT Filed Oct. 16, 2019, PCT No. PCT/CN2019/111495
§ 371(c)(1), (2) Date Jul. 21, 2020,
PCT Pub. No. WO2021/072681, PCT Pub. Date Apr. 22, 2021.
Prior Publication US 2022/0002859 A1, Jan. 6, 2022
Int. Cl. C23C 14/04 (2006.01); H10K 71/16 (2023.01)
CPC C23C 14/042 (2013.01) [H10K 71/166 (2023.02)] 14 Claims
OG exemplary drawing
 
1. A manufacturing method for a mask, comprising:
providing a test mask, wherein the test mask comprises a first clamping region and a second clamping region, which are opposite to each other in a first direction, and further comprises at least one mesh region between the first clamping region and the second clamping region, the at least one mesh region is in a target shape,
acquiring deformation state information of the mesh region in a case where the test mask is stretched along the first direction,
acquiring reverse compensation information for the mesh region according to the deformation state information, and obtaining target initial state information of the mesh region based on the reverse compensation information, and
manufacturing a mask according to the target initial state information, and the at least one mesh region of the mask manufactured being in a first shape.