CPC C09G 1/02 (2013.01) [B24B 7/228 (2013.01); C09K 3/1409 (2013.01); H01L 21/31053 (2013.01)] | 16 Claims |
1. A polishing composition comprising:
abrasive grains; a basic inorganic compound; an anionic water-soluble polymer; and a dispersing medium,
wherein a zeta potential of the abrasive grains is negative,
wherein the abrasive grains are alumina, wherein more than 50% of the alumina is in a γ-phase,
an aspect ratio of the alumina is less than 1.1,
in a particle size distribution of the abrasive grains obtained by a laser diffraction/scattering method, a ratio D90/D50 of a particle diameter D90 when an integrated particle mass reaches 90% of a total particle mass from a fine particle side to a particle diameter D50 when the integrated particle mass reaches 50% of the total particle mass from the fine particle side is more than 2.0, and
the basic inorganic compound is an alkali metal salt.
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