CPC B41J 2/14201 (2013.01) [B41J 2/1433 (2013.01); B41J 2/1652 (2013.01)] | 20 Claims |
1. A method, comprising:
forming, on a first side of a first wafer including semiconductor material, a piezoelectric actuator;
forming, in the first wafer and lateral to the piezoelectric actuator, an outlet channel;
forming a second wafer on the first wafer, the second wafer including semiconductor material, a recess, and at least one inlet channel fluidically coupled to the recess, the piezoelectric actuator being in the recess, the recess forming a reservoir configured to hold fluid;
forming a nozzle plate on a second side, opposite to the first side, of the first wafer; and
forming an ejection nozzle, at least partially aligned with the outlet channel, through the nozzle plate such that the ejection nozzle is fluidically coupled to the recess through the outlet channel.
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