US 11,881,375 B2
Common substrate and shadow ring lift apparatus
Abhishek Chowdhury, Bangalore (IN); Nataraj Bhaskar Rao, Bangalore (IN); Siqing Lu, Santa Clara, CA (US); and Ravikumar Patil, Bengaluru (IN)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 15, 2021, as Appl. No. 17/232,078.
Prior Publication US 2022/0336182 A1, Oct. 20, 2022
Int. Cl. H01J 37/08 (2006.01); H01J 37/32 (2006.01); H01J 37/24 (2006.01); H01J 37/248 (2006.01)
CPC H01J 37/08 (2013.01) [H01J 37/248 (2013.01); H01J 37/32642 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/3328 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A lift apparatus for use in a substrate processing chamber, comprising:
a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly;
a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly;
an actuator; and
a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.