CPC H01J 37/08 (2013.01) [H01J 37/248 (2013.01); H01J 37/32642 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/3328 (2013.01)] | 20 Claims |
1. A lift apparatus for use in a substrate processing chamber, comprising:
a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly;
a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly;
an actuator; and
a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.
|