CPC C08F 222/20 (2013.01) [G03F 7/0046 (2013.01)] | 18 Claims |
1. A nanoimprint lithography (NIL) soft mold polymeric material comprising a partially or totally polymerized or crosslinked precursor material comprising:
a curable fluorinated base resin component, comprising one or more UV curable groups;
one or more additives;
one or more nonfluorinated crosslinkers in a weight percent ranging from 1% to 25%; and
one or more of a photo radical generator, a photo acid generator, or both;
wherein the polymeric material has a Young's modulus ranging from 50 MPa to 2.5 GPa, and a water contact angle ranging from 900 to 115°.
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