US 11,879,024 B1
Soft mold formulations for surface relief grating fabrication with imprinting lithography
Zachary Perlmutter, Seattle, WA (US); Tingling Rao, Bellevue, WA (US); Giuseppe Calafiore, Woodinville, WA (US); and Emily Anne Makoutz, Carnation, WA (US)
Assigned to META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US)
Filed by META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US)
Filed on Jul. 14, 2021, as Appl. No. 17/375,874.
Claims priority of provisional application 63/051,758, filed on Jul. 14, 2020.
Int. Cl. C08F 222/20 (2006.01); G03F 7/004 (2006.01)
CPC C08F 222/20 (2013.01) [G03F 7/0046 (2013.01)] 18 Claims
 
1. A nanoimprint lithography (NIL) soft mold polymeric material comprising a partially or totally polymerized or crosslinked precursor material comprising:
a curable fluorinated base resin component, comprising one or more UV curable groups;
one or more additives;
one or more nonfluorinated crosslinkers in a weight percent ranging from 1% to 25%; and
one or more of a photo radical generator, a photo acid generator, or both;
wherein the polymeric material has a Young's modulus ranging from 50 MPa to 2.5 GPa, and a water contact angle ranging from 900 to 115°.