US 12,204,244 B2
Imprint apparatus and article manufacturing method
Tatsuya Arakawa, Kanagawa (JP); and Kenichi Kobayashi, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jul. 27, 2022, as Appl. No. 17/874,587.
Claims priority of application No. 2021-136374 (JP), filed on Aug. 24, 2021; and application No. 2022-083627 (JP), filed on May 23, 2022.
Prior Publication US 2023/0061381 A1, Mar. 2, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/0002 (2013.01) 16 Claims
OG exemplary drawing
 
1. An imprint apparatus for forming a pattern by curing a resin in a state where a pattern region in a mold is brought into contact with the resin on a shot region in a substrate, the imprint apparatus comprising:
an element configured to adjust an irradiation region of light from a light source with which the substrate is irradiated;
a measurement unit configured to measure a position of a mark formed in the mold; and
a controller configured to:
determine a deviation between a light coordinate system of the irradiation region of light and a mask coordinate system of the mold based on a measurement result of the position of only the mark formed in the mold by the measurement unit; and
correct the deviation by performing a predetermined correction on at least one of the position of the irradiation region of light or the position of the mark formed in the mold to align the light coordinate system with the mask coordinate system, based on the determined deviation.