| CPC G03F 7/0002 (2013.01) [G03F 9/7042 (2013.01)] | 16 Claims |
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1. An imprint method for forming a pattern on an imprint material supplied onto a substrate using a mold, the method comprising:
performing an adjustment process of adjusting an illumination condition while illuminating a mold mark formed on the mold and a substrate mark formed in a first shot region in a state in which the mold and the imprint material supplied to the first shot region on the substrate are brought into contact with each other;
performing a deriving process of deriving an approximate illumination function indicating an illumination condition for a second shot region on the substrate, wherein the second shot region is different from the first shot region on the substrate, on the basis of the illumination condition for the first shot region adjusted in the adjustment process and a position of the first shot region, wherein the approximate illumination function indicates the illumination condition depending on a position of the second shot region on the substrate; and
adjusting the illumination condition for the second shot region on the substrate based on the approximate illumination function and a position of the second shot region on the substrate,
wherein the deriving process is performed without illuminating the mold mark and the substrate mark formed in the second shot region on the substrate.
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